Personal Information
Chang Xijiang, Male,Ph.D, Associate Professor, Shanghai University of Engineering Science, College of Electronic and Electrical Engineering, Electronic Science and Technology, 021-55661084，091031001@fudan.edu.cn
Research Fields
Low temperature plasma generation，characterization and applications
Plasma diagnosis Neutral beam technology for damage-free plasma processing
Research Achievements
1.Wu Zhonghang, etc. Characteristic of Columniform Surface Wave Plasma Excited around Quartz Rod by 2.45 GHz Microwave [J]. Plasma Sci. Technol., 2016, accepted (Corresponding author)
2.Yoshiyuki Kikuchi, Xijiang Chang, etc. Amorphous carbon nitride thin films for electrochemical electrode: Effect of molecular structure and substrate materials [J]. Carbon, 2015, 93: 207-216 (Joint first author)
3.Xiaoli Yang, Xijiang Chang, etc. Oxygen atomic density measured with a self-absorption calibrated vacuum ultraviolet absorption spectroscopy and its effect on spore etching in N2/O2 surface-wave plasma [J]. Jpn. J. Appl. Phys., 2015, 54, 070308 (Joint first author)
4.Xijiang Chang, etc. Development of a large-area planar surface-wave plasma source with a cavity launcher driven by a 915MHz UHF wave [J]. Plasma Sources Sci. Technol., 2013, 22
5.Xijiang Chang, etc. Study of cavity type antenna structure of large-area 915 MHz ultra-high frequency wave plasma device based on three-dimensional finite difference time-domain analysis [J]. J. Appl. Phys., 2013, 114, 183302
